Candidates should have expertise in at least one family of nanoscale characterization techniques
Study Subject: Physics or Material Sciences
Employer: the Catalan Institute of Nanotechnology
Level: Postdoctoral
Scholarship Description: The position is open in the context of the new European FP7 project “Large area molecularly assembled Nanopatterns for Devices (LAMAND) which investigates the use of block copolymer self-assembly and the concept of molecular machining to realize a scaleable, manufacturable process for nanopatterning substrate surfaces at dimensions consistent with industry roadmap goals for new nanoelectronic device technologies. Emphasis will be given in the development of new technologies, based on nanoimprint lithography (NIL), and novel intelligent and functionalised resist materials. Two key responsibilities are at the base of this postdoctoral position: (i) the design and fabrication of structures to deliver to project partners using electron beam lithography, thermal and UV assisted NIL and (ii) to characterise the fabricated nanostructures using SEM and AFM imaging techniques. Experience in nanofabrication and
characterization of resist materials is essential.
The applicant should have (a) a PhD in physics or material sciences or electrical engineering, (b) expertise in nanofabrication processes, (c) clean room experience and (d) expertise in at least one family of nanoscale characterisation techniques, eg., structural, physical, optical, thermal. Other areas of expertise which are welcome include: nanoimprint lithography, step and flash imprint lithography, polymer functionalisation and nanometrology approaches. Excellent communications skills and readiness to travel to project meetings are crucial.
Scholarship Application Deadline: 31/12/2010
